摘要 :
Trapped, solvated electrons in primary, secondary and tertiary amine glasses have been studied by EPR and ENDOR to deduce aspects of the geometrical structure of the amines around the electrons. NH deuteration experiments show no ...
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Trapped, solvated electrons in primary, secondary and tertiary amine glasses have been studied by EPR and ENDOR to deduce aspects of the geometrical structure of the amines around the electrons. NH deuteration experiments show no effect on the EPR and ENDOR linewidths of trapped electrons in primary and secondary amines and indicate that the alkyl protons are closer than the NH protons to the electron. The trapped electron EPR linewidths are larger in primary and secondary amines approx. 7G) than in tertiary amines (approx. 4G) which suggests a small contact hyperfine coupling; this is supported by ENDOR data. In tertiary amines EPR and ENDOR results on trapped electrons suggest that the proton interaction is purely dipolar and that the closet protons are < 3.4 A from the electron. In the more polar primary and secondary amines the small proton contact interaction suggests that the closet protons are < 3.4 A from the electron. (Author)
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摘要 :
EPR and matrix ENDOR spectra have been examined for polyenyl radicals in gamma-irradiated PVF, PVF2, PVC, and PMMA polymers. Proton matrix ENDOR is observed for all four polymers, and fluorine matrix ENDOR for PVF and PVF2. By lin...
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EPR and matrix ENDOR spectra have been examined for polyenyl radicals in gamma-irradiated PVF, PVF2, PVC, and PMMA polymers. Proton matrix ENDOR is observed for all four polymers, and fluorine matrix ENDOR for PVF and PVF2. By line shape analysis of the ENDOR spectra obtained under comparable conditions, delocalization diameters for the unpaired electron of the polyenyl radical in each polymer are obtained. These diameters indicate extensive delocalization over 5-7 carbon double bonds for the polyenyl radicals investigated. It is suggested that these conjugated and crosslinked radiation products account for the observed nondevelopment of electron beam resist PMMA material at high radiation charge densities. (Author)
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